High Power Impulse Magnetron Sputtering (HIPIMS, also known as High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely high power densities of the order of kWcm<sup>−2</sup> in short pulses (impulses) of tens of microseconds at low duty cycle (on/off time ratio) of < 10%. A distinguishing feature of HIPIMS is its high degree of ionisation of the sputtered metal and high rate of molecular gas dissociation.
HIPIMS is used for:
adhesion enhancing pretreatment of the substrate prior to coating deposition (substrate etching)
deposition of thin films with high microstructure density
The first US patent on HIPIMS was filed by Vladimir Kouznetsov (priority date 9 Dec 1997), Kouznetsov US 6296742 B1.
HIPIMS Plasma Discharge
HIPIMS plasma is generated by a glow discharge where the discharge current density can reach up to 6 Acm<sup>−2</sup>, whilst the discharge voltage is maintained at several hundred volts. The discharge is homogeneously distributed across the surface of the cathode of the chamber.HIPIMS generates a high density plasma of the order of 10<sup>13</sup> ions cm<sup>−3</sup> containing high fractions of target metal ions. The main ionisation mechanism is electron impact, which is... Read More